ion-beam-assisted deposition

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• Ion beam assisted deposition — or IBAD or IAD (not to be confused with ion beam induced deposition, IBID) is a materials engineering technique which combines ion implantation with simultaneous sputtering or another physical vapor deposition technique. Besides providing… …   Wikipedia

• Ion beam deposition — (IBD) is a process of applying materials to a target through the application of an ion beam.In an ion source source materials gases or evaporated solids are ionized using electron ionization or by application of high electric fields (Penning ion… …   Wikipedia

• Focused ion beam — Focused ion beam, also known as FIB, is a technique used particularly in the semiconductor and materials science fields for site specific analysis, deposition, and ablation of materials. The FIB is a scientific instrument that resembles a… …   Wikipedia

• Ion plating — is a physical vapor deposition (PVD) process that is sometimes called ion assisted deposition (IAD) or ion vapor deposition (IVD) and is a version of vacuum deposition . Ion plating utilizes concurrent or periodic bombardment of the substrate and …   Wikipedia

• Electron beam physical vapor deposition — or EBPVD is a form of physical vapor deposition in which a target anode is bombarded with an electron beam given off by a charged tungsten filament under high vacuum. The electron beam causes atoms from the target to transform into the gaseous… …   Wikipedia

• Ionenstrahlgestützte Deposition — Die ionenstrahlgestützte Deposition, auch ionenstrahlgestützte Abscheidung, ionenstrahlgestützte Beschichtung oder ionenstrahlgestützte Beschichtungstechnik genannt, (englisch ion beam assisted deposition, IBAD) ist ein… …   Deutsch Wikipedia

• Physical vapor deposition — Der Begriff physikalische Gasphasenabscheidung (englisch physical vapour deposition, kurz PVD) bezeichnet eine Gruppe von vakuumbasierten Beschichtungsverfahren bzw. Dünnschichttechnologien, bei denen im Gegensatz zu CVD Verfahren die Schicht… …   Deutsch Wikipedia

• Physical vapour deposition — Der Begriff physikalische Gasphasenabscheidung (englisch physical vapour deposition, kurz PVD) bezeichnet eine Gruppe von vakuumbasierten Beschichtungsverfahren bzw. Dünnschichttechnologien, bei denen im Gegensatz zu CVD Verfahren die Schicht… …   Deutsch Wikipedia

• Ion source — An ion source is an electro magnetic device that is used to create charged particles. These are used primarily within mass spectrometers or particle accelerators.Mass spectrometry In mass spectrometry, an ion source is a piece of equipment used… …   Wikipedia

• Electron beam physical vapor deposition — Traduction à relire Electron beam physical vapor deposition → …   Wikipédia en Français

• Sputter deposition — is a physical vapor deposition (PVD) method of depositing thin films by sputtering, that is ejecting, material from a target, that is source, which then deposits onto a substrate, such as a silicon wafer. Resputtering is re emission of the… …   Wikipedia